Mask Alignment System Market

As per Market Research Future Analysis, the global mask alignment system market was valued at USD 1.5 billion in 2021 and is projected to grow at a CAGR of 10% from 2020 to 2027. This growth is driven by the increasing demand for semiconductor ICs and advancements in nanotechnology applications, particularly in nanosensors. The COVID-19 pandemic temporarily hindered market growth due to supply chain disruptions and manufacturing shutdowns, but demand rebounded post-lockdown. The market is segmented by type (semi-automated and fully automated), application (MEMS devices, compound semiconductors, LED devices), and end-user (foundry/factory, memory chip manufacturer, integrated device manufacturer). Asia-Pacific leads the market due to its dominance in semiconductor manufacturing, followed by North America.

Bruker Corporation (U.S), Vistec Electron Beam GmbH (Germany), SUSS MicroTec AG (Germany), Neutronix Inc (U.S), Aixtron SE (Germany), Applied Materials, Inc (U.S), Veeco Instruments, Inc (U.S), E V Group (Austria), ASML Holding (Netherlands)

• EV group introduced the innovative IQ Aligner NT mask alignment system which is the most productive and technically sophisticated and automated. This is designed for high-volume applications. It has the latest features like the highly advanced print gab control and zero-assist dual-size wafer processing capability that fully addresses the high-volume manufacturing (HVM) requirements of users. Also, it is designed with 2X improvement in alignment accuracy & throughput compared to the previous generation IQ Aligner system